AustralieFrV1, Main, Exploration, bibRecord, 00B804

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Identifieur interne : 00B804 ( Main/Exploration ); précédent : 00B803; suivant : 00B805

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Auteurs : Richard Payling [Australie] ; Patrick Chapon [France] ; Olivier Bonnot [France] ; Philippe Belenguer [France] ; Philippe Guillot [France] ; Leanne C. Pitchford [France] ; Laurent Therese [France] ; Johann Michler [Suisse] ; Max Aeberhard [Suisse]

Source :

ISIJ international [ 0915-1559 ] ; 2002.

RBID : Pascal:02-0343469

Descripteurs français

Pascal (Inist)
- Spectrométrie optique, Emission optique, Décharge luminescente, Radiofréquence, Chimie analytique, Source ion plasma, Revêtement, Dépôt métal, Traitement surface, Etude expérimentale.
Wicri :
- topic : Chimie analytique.

English descriptors

KwdEn :
- Analytical chemistry, Coatings, Experimental study, Glow discharge, Light emission, Metal deposition, Optical spectrometry, Plasma ion source, Radiofrequency, Surface treatment.

Abstract

The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.

Affiliations:

Links toward previous steps (curation, corpus...)

to stream PascalFrancis, to step Corpus: 005722
to stream PascalFrancis, to step Curation: 000A17
to stream PascalFrancis, to step Checkpoint: 005512
to stream Main, to step Merge: 00C633
to stream Main, to step Curation: 00B804

Le document en format XML

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<term>Optical spectrometry</term>
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<front><div type="abstract" xml:lang="en">The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.</div>
</front>
</TEI>
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<country name="Suisse"><noRegion><name sortKey="Michler, Johann" sort="Michler, Johann" uniqKey="Michler J" first="Johann" last="Michler">Johann Michler</name>
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Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri